The report "Photoresist & Photoresist Ancillaries Market by Application (Semiconductor & IC,LCD, PCB), Photoresist Type (ArF Immersion, ArF Dry Film, KrF, G-line & I-line), Ancillary Type (Anti-reflective Coating, Remover, Developer), Region - Global Forecast to 2025", size is estimated to be USD 3.3 billion in 2020 and projected to reach USD 4.2 billion, by 2025, at a CAGR of 4.8%. The growth of the market is attributed to increasing demand for high-end semiconductors chip or ICs for applications such as nano-devices, IoT, 5G, and artificial intelligence.
The key companies profiled in the photoresist and photoresist ancillaries market report are Tokyo Ohka Kogyo Co., Ltd (Japan), JSR Corporation (Japan), DuPont (US), Shin-Etsu Chemical Co., Ltd (Japan), Fujifilm Corporation (Japan), Sumitomo Chemical Co., Ltd. (Japan), ALLRESIST (Germany), Merck Group (Germany), Micro Resist Technology (Germany), and DJ MicroLaminates (US).
